Facilities

The NPM group conducts research using facilities and instrumentation in our own labs as well as that available to us through:

• Department of Chemistry, UCF
• CREOL, The College of Optics and Photonics, UCF
• Materials Characterization Facility, UCF
• Advanced Microfabrication Facility, UCF

NPM Laboratory

The NPM Group's labs are outfitted so researchers can do nearly all materials preparation, chemical synthesis, and micro- and nano-fabrication in our own facility. Important components and integrated systems are listed below with a brief description of their use.

Safety Equipment
Our safety equipment includes: three screened fume hoods, emergency shower and eye-wash stations, an explosion-proof freezer, first aid kits, shields to block scattered laser light, and personal safety items, such as chemical splash goggles, laser goggles, lab coats, etc.). The University has a team of environmental health and safety experts available for consultation and disposal of waste materials.

3D Microfabrication System
The NPM-Group 3D Microfabrication System enables laboratory-scale fabrication of three-dimensional microstructures using a wide range of material systems. The system consists of:

"Mira" and "Verdi VI" femtosecond-pulse laser system (Coherent)
"Grenouille" Laser Pulse Diagnostics System (Swamp Optics)
HR4000 spectrometer (Ocean Optics)
Photodiodes for relative power measurement
Routing optics
Optical attenuator
Beam telescope
TE2000-U inverted microscope (Nikon)
CoolSnap CCD camera (Photometrics)
P-563.3CD 3-axis nanopositioner (Physik Instrumente)
MP-285 3-axis micropositioner (Sutter Instruments)
TRIAX 350 spectrometer system (Horiba-Jobin-Yvon)
Modular instrumentation rack (ITEM America)

Mira and Verdi VI Femtosecond-Pulse Laser System
This system consists of a Coherent Verdi VI diode-pumped solid-state laser and a Coherent Mira 900F Ti:sapphire mode-locked oscillator. The Verdi produces 6 W of CW laser power at a wavelength of 532 nm. When pumped by the Verdi VI, the Mira produces 120-fs pulses at a 76 MHz repetition rate and a center wavelength that is tunable from 700 to 1000 nm with a peak output power of 1 W at 800 nm. Our laser is also equipped with the Optima laser diagnostics system. The Mira output is used for multi-photon excitation and multi-photon 3D microfabrication. We also have the Sartorius optics package that compresses the pulse duration to 50 fs when installed in the Mira.

Grenouille Laser Pulse Diagnostics System
The Grenouille, manufactured by Swamp Optics, provides complete spectral and temporal characterization of femtosecond laser pulses via the frequency-resolved optical gating technique. Using this device, we can optimize the Mira laser mode-locking in real time. The system is generally adjusted to produce nearly transform-limited pulses to optimize multi-photon excitation.

HR4000 Spectrometer
The Ocean Optics HR4000 is a compact 0.2-Angstrom resolution Czerny-Turner spectrometer. Light is dispersed by a holographic grating and imaged onto a CCD array. The recorded data are transferred via USB interface to a microcomputer for display and recording. We use the HR4000 for general spectroscopy and for spectral analysis of femtosecond laser pulses.

TE2000-U Inverted Microscope
The Nikon TE2000-U is an inverted microscope with an open optical-platform that enables flexible reconfiguration and integration of optical components. The TE2000-U is used for reflection, transmission, and fluorescence imaging in bright- and dark-field modes. We also have the optics needed for polarization microscopy and phase-contrast imaging.

We thank Nikon Instruments, Inc. for partly sponsoring our research by generously discounting the TE2000-U system through their membership in the CREOL Industrial Affiliates Program.

CoolSNAP_ES CCD Camera
The Photometrics CoolSNAP_ES is a 4 megapixel CCD camera used to capture images with the TE2000 microscope. The CoolSNAP_ES features a 12-bit 20 MHz digitizer that supports video frame rate imaging and a fanless design that eliminates unwanted vibrations and the need for an external power supply.

P-563.3CD 3-Axis Nanopositioner (model P-562.3CD shown)
The P-563.3CD is a 3-axis nanopositioner manufactured by Physik Instrumente. The P-563 is used for high-precision multi-photon 3D microfabrication and general nano-positioning requirements. The P-563 provides 300 microns of travel in each axis with a bi-directional repeatability of 1 nm. The motion is actuated by piezoelectric stacks driven by an applied potential of 0 - 120 V. The drive voltages are provided by a set of closed-loop linear voltage amplifiers that accept a 0 - 10 V input signal and monitor the absolute position via capacitive sensors built into each axis.

MP-285 3-Axis Micropositioner
The MP-285, manufactured by Sutter Instruments, is a 3-axis micropositioner that provides vector motion with 25 mm travel in all axes. The minimum step size is 40 nm and the bi-directional repeatability is 1 micron. The system is used for 3D microfabrication and general micro-positioning applications.

We thank Sutter Instruments for partly sponsoring our research by generously discounting the MP-285 system.

TRIAX 320
The TRIAX 320, manufactured by Horiba-Jobin-Yvon, is 320-mm focal length single-grating spectometer/spectrograph that we use for reflection, fluorescence and dark-field spectroscopy.  Our instrument is configured with dual entrance and exit optical paths.  Automated entrance- and exit-port mirrors allow us to switch between the various optical paths.  One output path has a flat optical focal plane for imaging spectroscopy.  The other output path is designed for conventional scanning spectroscopy.  For detection we have a Hamamatsu R928 photomultiplier tube and a SpectraAcq2 single photon counting acquisition system.  All data acquisition and spectrometer configuration is automated under computer control via RS-232 and IEEE interfaces.

We thank Horiba-Jobin-Yvon for partly sponsoring our research by generously discounting the TRIAX 320 system through their membership in the CREOL Industrial Affiliates Program.

Schlenk Line
The Schlenk line is used for synthesis of air and moisture sensitive chemicals and for performing certain materials processes under an inert atmosphere.

ChemStar Pump
The Welch ChemStar pump is a high-displacement two-stage oil pump dedicated for use with the Schlenk Line.

Programmable Dry Vacuum Pump
The Welch model 2028 2-Torr programmable self-cleaning dry vacuum pump is used for rotary evaporation and general purpose evacuation.

Explosion-Proof Freezer
We store our highly reactive chemicals in a Fisher-brand "IsoTemp" explosion-proof freezer. The compressor mechanism of an explosion proof fridge/freezer is hermetically sealed so that vapors that might accumulate inside are not ignited when the compressor cycles on and off. Take a look here at what can happen when chemicals are stored in non-explosion-proof refrigerators/freezers!

Chemical Synthesis Glassware
Our chemical and materials synthesis equipment includes an extensive array of glassware for preparative chemistry and chemical purification.

Department of Chemistry

The Chemistry Department at UCF maintains the following instrumentation:

• NMR spectrometers (Mercury 300 and UNITY 500 MHz, 1H, 13C & 15N probes)
• IR spectrophotometers (Perkin-Elmer 1600 FTIR, Perkin-Elmer SpectrumOne, Thermo IR100)
• UV/Vis/Near-IR spectrophotometers (Varian CARY Bio3, Agilent 8453, Perkin-Elmer Lambda 25)
• Spectrofluorimeters (Time-resolved PTI Quantamaster, Hitachi F2000, Ocean Optics SD2000)
• Spectropolarimeter (Rudolph Research Autopol IV)
• Atomic absorption spectrophotometers (Varian Spectra AA-20+ & Perkin-Elmer 5000 AA/ICP)
• X-ray powder diffractometer (Rigaku)
• FTIR microscope (Mattson, Genysis platform, and Spectra-Tech Advantage, ATR cell)
• Raman microscope (Olympus BX40 and Horiba-Jobin-Yvon integrated system)
• Microscopy digital imaging system (AlphaImager 2200)
• Nomarski differential-interference contrast microscope and camera system
• Gas Chromatography / Mass spectrometry systems (Agilent 5973, Thermo Finnigan Trace DSQ GC/MS, & PolarisQ)
• Liquid-phase separation systems (Waters 660 gel permeation/gradient HPLC, ABI Prism 310 capillary electrophoresis analyzer)
• Electrochemical analysis and deposition systems (IBM EC225 Voltametric Analyzer and CH Instruments 1660A, EG&G/PARC model 273 potentiostat/galvanostat)
• Differential scanning calorimeter / thermogravimetric analyzer (SETARAM, Mettler TC11 TA/TGA/DSC, TA Instruments 2920 DSC & 2050 TGA)
• Mercury dilatometer (ADA/NIST Model 520)
• Glove box (Labconco Protector)
• Rayonet photochemical reactor
• De-ionized water purification facility

CREOL, The College of Optics and Photonics

The instruments listed below are available for our research through the PI's joint appointment in CREOL, The College of Optics and Photonics. These facilities are maintained in a class 1000 clean room.

• Surface profiler (Tencor Alpha-Step 200)
• Metal sputter coater (Edwards Auto-306 / FL400)
• Plasma enhanced chemical vapor deposition system (Plasma Therm 790)
• Electron-beam lithography system (Leica EBPG5000+)

Leica EBPG5000+ electron-beam lithography system at CREOL, UCF

Materials Characterization Facility

The Materials Characterization Facility is a user facility at the University of Central Florida equipped with the following instrumentation:

• Auger electron spectrometer / Scanning Auger microprobe system (Physical Electronics 600)
• X-ray photoelectron spectrometer (Physical Electronics 5400)
• Electron probe micro-analyzer (JEOL 733 Super Probe)
• Focused ion beam instrument (FEI 200 TEM)
• Scanning probe microscope (STM, AFM, PicoSPM Molecular Imaging)
• Rutherford backscattering spectrometer (Geneal IONIX 1.7 MU Tandetron
• Scanning electron microcope (JEOL 6400F and Hitachi 3500N)
• Static secondary-ion mass spectrometry (SIMS) microscope (CAMECA IMS-3F)
• Dynamic secondary-ion mass spectrometry (SIMS) microscope (PHI Adept 1010)
• Transmission electron microscope (FEI Tecnai F30)
• X-ray diffractometer (Rigaku D/Max)

Tecnai F30 transmission electron microscope at the UCF Materials Characterization Facility

Advanced Microfabrication Facility

The Advanced Microfabrication Facility is a user facility at the University of Central Florida equipped with the following instrumentation:

• Ammonia oven
• Dicing diamond saw
• Isotemp programmable furnace
• Mini-Brute 4" furnaces
• Strasbaugh CMP
• LFE Barrell asher
• MJB-3 mask aligner I
• MJB-3 mask aligner II
• Quintel mask aligner
• Tamarak contact printer
• AJA six-gun sputtering system
• AJA three-gun sputtering system
• Edwards #2 multi-filament evaporator
• Edwards diffusion filament evaporator
• Plasma Technology - Plasma-enhanced chemical vapor deposition system
• Plasma Technology - Reactive ion etcher
• AlphaStep profilometer
• Amray 1700 scanning electron microscope
• Elipsometer
• HP 4145B transistor parameter analyzer
• HP 4192LF impedance analyzer
• Keithley CF System
• Magnetron four-point probe
• Signatone 8" four-point probe
• DC probe station
• Wentworth RF probe station
• 6-axis micropositioner
• Nikon distance measurement microscope, 4"-travel
• Nikon inspection microscope
• Tektronix curve tracers
• VEECO interferometric surface profiler