Research -- Nano-Patterning

Photolithography remains one of the most versatile methods for patterning materials. However, it has found limited use in nano-science because the smallest feature that can be obtained using conventional optical systems has dimensions on the order of the wavelength of the excitation radiation. Sub-wavelength-aperture scanning probe tips, of the type used for near-field scanning optical microscopy (NSOM), can be used to photo-excite regions that are much smaller than the diffraction limit. A type of near-field scanning optical lithography (NSOL) has been reported in which piezoelectrically scanned NSOM tips are used to pattern serially a photosensitive surface with nanometer precision. NSOL should be a tremendously powerful tool for nano-science and technology because (1) it enables sub-wavelength-sized features to be patterned with nanometer-precision and (2) it can be adapted for patterning the wide range of materials for which conventional photolithographic processes exist. We will develop methods for patterning materials onto surfaces by NSOL and adapt these processes for creating nano-photonic structures.

Nano-patterning approach based on near-field scanning optical lithography.

>> Research main page